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ISO 21859:2019
ISO 21859:2019 Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
standard by International Organization for Standardization, 07/01/2019
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M00051384
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Full Description
ISO 21859:2019 specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
